Fabricating photonics structure light signal transmission regions

There is set forth herein a method including depositing a layer formed of barrier material over a conductive material formation of a photonics structure; and removing material of the layer in a light signal transmitting region of the photonics structure. In one embodiment the barrier material can in...

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Bibliographische Detailangaben
Hauptverfasser: Leake, Jr., Gerald L, Coolbaugh, Douglas
Format: Patent
Sprache:eng
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Zusammenfassung:There is set forth herein a method including depositing a layer formed of barrier material over a conductive material formation of a photonics structure; and removing material of the layer in a light signal transmitting region of the photonics structure. In one embodiment the barrier material can include silicon carbon nitride. In one embodiment the barrier material can include silicon nitride.