Pump apparatus and substrate treating apparatus

A drive mechanism deforms two diaphragms to perform alternate increase and decrease in volume of a supply chamber. At this time, the two diaphragms are provided for the single supply chamber. This leads to possibility of suction and feed out of a desired amount of liquid even with limited deformatio...

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Bibliographische Detailangaben
1. Verfasser:	Kashiyama, Masahito
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL BASIC ELECTRIC ELEMENTS BLASTING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY HEATING LIGHTING MECHANICAL ENGINEERING PERFORMING OPERATIONS POSITIVE DISPLACEMENT MACHINES FOR LIQUIDS PUMPS PUMPS FOR LIQUIDS OR ELASTIC FLUIDS SEMICONDUCTOR DEVICES SPRAYING OR ATOMISING IN GENERAL TRANSPORTING WEAPONS
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Beschreibung
Zusammenfassung:	A drive mechanism deforms two diaphragms to perform alternate increase and decrease in volume of a supply chamber. At this time, the two diaphragms are provided for the single supply chamber. This leads to possibility of suction and feed out of a desired amount of liquid even with limited deformation of the diaphragms. In addition, the two diaphragms achieve suppression in deformation thereof upon suction and feed out of a desired amount of liquid. This allows selection of the diaphragms each with a short stroke, yielding suppressed stagnation and quality degradation of the liquid.