Laser processing method and laser processing apparatus

Disclosed herein is a laser processing method including a first application step of applying a first laser beam having a pulse width shorter than time of electron excitation generated by application of a laser beam to a workpiece, and a second application step of applying a second laser beam within...

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Bibliographische Detailangaben
Hauptverfasser: Morikazu, Hiroshi, Takeda, Noboru
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:Disclosed herein is a laser processing method including a first application step of applying a first laser beam having a pulse width shorter than time of electron excitation generated by application of a laser beam to a workpiece, and a second application step of applying a second laser beam within the electron excitation time.