Split gate charge trapping memory cells having different select gate and memory gate heights

A semiconductor device that has a split gate charge trapping memory cell having select and memory gates of different heights is presented herein. In an embodiment, the semiconductor device also has a low voltage transistor and a high voltage transistor. In one embodiment, the gates of the transistor...

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Bibliographische Detailangaben
Hauptverfasser: Fang, Shenqing, Ramsbey, Mark, Chen, Chun
Format: Patent
Sprache:eng
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Zusammenfassung:A semiconductor device that has a split gate charge trapping memory cell having select and memory gates of different heights is presented herein. In an embodiment, the semiconductor device also has a low voltage transistor and a high voltage transistor. In one embodiment, the gates of the transistors are the same height as the select gate. In another embodiment, the gates of the transistors are the same height as the memory gate.