Cleaning method and plasma processing apparatus

In a cleaning method according to an exemplary embodiment, a plasma is formed from a cleaning gas in a chamber of a plasma processing apparatus. A focus ring is mounted on a substrate support in the chamber to extend around a central axis of the chamber. While the plasma is formed, a magnetic field...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	Hosoya, Masanori, Iwano, Mitsuhiro
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CLEANING CLEANING IN GENERAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL TRANSPORTING
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	In a cleaning method according to an exemplary embodiment, a plasma is formed from a cleaning gas in a chamber of a plasma processing apparatus. A focus ring is mounted on a substrate support in the chamber to extend around a central axis of the chamber. While the plasma is formed, a magnetic field distribution is formed in the chamber by an electromagnet. The magnetic field distribution has a maximum horizontal component in a location on the focus ring or a location outside the focus ring in a radial direction with respect to the central axis.