Devices and methods for non-planar photolithography of nail polish

Systems and methods for patterning nail polish are disclosed. In one embodiment, the system includes a source of light, and a programmable mask that can selectively transmit light to a photoresist nail polish. In some embodiments, the programmable mask is a liquid crystal display (LCD) or a digital...

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Bibliographische Detailangaben
Hauptverfasser:	Casasanta, III, Vincenzo, Miller, Zane Bowman Allen
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	Systems and methods for patterning nail polish are disclosed. In one embodiment, the system includes a source of light, and a programmable mask that can selectively transmit light to a photoresist nail polish. In some embodiments, the programmable mask is a liquid crystal display (LCD) or a digital light processing screen (DLP). The system may also include a controller configured for controlling the light transmission properties of the programmable mask.