Gamma groove arrays for interconnecting and mounting devices

Devices with gamma (γ) grooves are disclosed. The γ grooves can be used to form optical fiber arrays. The γ grooves can be formed using a dry etch, such as RIE, by modifying resist features of an etch mask to have convex curved sidewalls. The profile of the resist features is transferred to the subs...

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Bibliographische Detailangaben
Hauptverfasser: Liu, Bo, Lam, Jeffrey C, Huang, Yamin, Mai, Zhihong
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:Devices with gamma (γ) grooves are disclosed. The γ grooves can be used to form optical fiber arrays. The γ grooves can be formed using a dry etch, such as RIE, by modifying resist features of an etch mask to have convex curved sidewalls. The profile of the resist features is transferred to the substrate by the dry etch to form the γ grooves. The γ grooves are formed without K containing etchants, avoiding K+ ions contamination of process tools as well as health issues caused by handling alkali containing devices.