Advanced copper interconnects with hybrid microstructure

A device relates to a semiconductor device. The semiconductor device includes a narrow-line bamboo microstructure integrated within a metal layer of the semiconductor device and a narrow-line polycrystalline microstructure. The narrow-line polycrystalline microstructure is integrated within the same...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Yang, Chih-Chao, Edelstein, Daniel C
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A device relates to a semiconductor device. The semiconductor device includes a narrow-line bamboo microstructure integrated within a metal layer of the semiconductor device and a narrow-line polycrystalline microstructure. The narrow-line polycrystalline microstructure is integrated within the same metal layer as the narrow-line bamboo microstructure.