Methods and materials for modifying the threshold voltage of metal oxide stacks

Methods of modifying the threshold voltage of metal oxide stacks are discussed. These methods utilize materials which provide larger shifts in threshold voltage while also being annealed at lower temperatures.

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Hauptverfasser: Ma, Paul F, Krishnan, Siddarth, Basu, Atashi, Sathiyanarayanan, Rajesh
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creator Ma, Paul F
Krishnan, Siddarth
Basu, Atashi
Sathiyanarayanan, Rajesh
description Methods of modifying the threshold voltage of metal oxide stacks are discussed. These methods utilize materials which provide larger shifts in threshold voltage while also being annealed at lower temperatures.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US10615041B2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US10615041B2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US10615041B23</originalsourceid><addsrcrecordid>eNqNjDsOwjAMQLMwIOAO5gBIDZ8eAARiQQzAXFmN00YkcRVbCG5PBw7A8PSWpzc11wtpz04As4OESiVgFPBcILEL_hNyB9rTSCHpOTp4cVTsCNhDIsUI_A6OQBTbp8zNxI8DWvw8M8vT8X44r2jghmTAljJp87jZqra7amv3680_zRdgETcO</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Methods and materials for modifying the threshold voltage of metal oxide stacks</title><source>esp@cenet</source><creator>Ma, Paul F ; Krishnan, Siddarth ; Basu, Atashi ; Sathiyanarayanan, Rajesh</creator><creatorcontrib>Ma, Paul F ; Krishnan, Siddarth ; Basu, Atashi ; Sathiyanarayanan, Rajesh</creatorcontrib><description>Methods of modifying the threshold voltage of metal oxide stacks are discussed. These methods utilize materials which provide larger shifts in threshold voltage while also being annealed at lower temperatures.</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; SEMICONDUCTOR DEVICES</subject><creationdate>2020</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20200407&amp;DB=EPODOC&amp;CC=US&amp;NR=10615041B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20200407&amp;DB=EPODOC&amp;CC=US&amp;NR=10615041B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Ma, Paul F</creatorcontrib><creatorcontrib>Krishnan, Siddarth</creatorcontrib><creatorcontrib>Basu, Atashi</creatorcontrib><creatorcontrib>Sathiyanarayanan, Rajesh</creatorcontrib><title>Methods and materials for modifying the threshold voltage of metal oxide stacks</title><description>Methods of modifying the threshold voltage of metal oxide stacks are discussed. These methods utilize materials which provide larger shifts in threshold voltage while also being annealed at lower temperatures.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2020</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNjDsOwjAMQLMwIOAO5gBIDZ8eAARiQQzAXFmN00YkcRVbCG5PBw7A8PSWpzc11wtpz04As4OESiVgFPBcILEL_hNyB9rTSCHpOTp4cVTsCNhDIsUI_A6OQBTbp8zNxI8DWvw8M8vT8X44r2jghmTAljJp87jZqra7amv3680_zRdgETcO</recordid><startdate>20200407</startdate><enddate>20200407</enddate><creator>Ma, Paul F</creator><creator>Krishnan, Siddarth</creator><creator>Basu, Atashi</creator><creator>Sathiyanarayanan, Rajesh</creator><scope>EVB</scope></search><sort><creationdate>20200407</creationdate><title>Methods and materials for modifying the threshold voltage of metal oxide stacks</title><author>Ma, Paul F ; Krishnan, Siddarth ; Basu, Atashi ; Sathiyanarayanan, Rajesh</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US10615041B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2020</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>Ma, Paul F</creatorcontrib><creatorcontrib>Krishnan, Siddarth</creatorcontrib><creatorcontrib>Basu, Atashi</creatorcontrib><creatorcontrib>Sathiyanarayanan, Rajesh</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Ma, Paul F</au><au>Krishnan, Siddarth</au><au>Basu, Atashi</au><au>Sathiyanarayanan, Rajesh</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Methods and materials for modifying the threshold voltage of metal oxide stacks</title><date>2020-04-07</date><risdate>2020</risdate><abstract>Methods of modifying the threshold voltage of metal oxide stacks are discussed. These methods utilize materials which provide larger shifts in threshold voltage while also being annealed at lower temperatures.</abstract><oa>free_for_read</oa></addata></record>
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subjects BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
title Methods and materials for modifying the threshold voltage of metal oxide stacks
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-04T13%3A35%3A23IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=Ma,%20Paul%20F&rft.date=2020-04-07&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS10615041B2%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true