Method for producing multilayer submicron particles by laser pyrolysis

Disclosed is a method for producing particles, including the steps: introducing, into a reaction chamber, at least one reaction flow including a first chemical element and propagating in a direction of flow; projecting a radiation beam through the reaction chamber, intersecting each reaction stream...

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Bibliographische Detailangaben
1. Verfasser:	Tenegal, Francois
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COMPOUNDS THEREOF DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL INORGANIC CHEMISTRY MANUFACTURE OR TREATMENT OF NANOSTRUCTURES MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES METALLURGY NANOTECHNOLOGY NON-METALLIC ELEMENTS PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION THEIR RELEVANT APPARATUS TRANSPORTING
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Beschreibung
Zusammenfassung:	Disclosed is a method for producing particles, including the steps: introducing, into a reaction chamber, at least one reaction flow including a first chemical element and propagating in a direction of flow; projecting a radiation beam through the reaction chamber, intersecting each reaction stream in one interaction area per reaction flow, to form, in each reaction flow, particle cores including the first chemical element; and introducing, into the reaction chamber, a second chemical element interacting with each reaction flow to cover the particle cores with a layer including the second chemical element. Each reaction flow is preferably free of any agent oxidizing the first chemical element. Preferably a ratio of one atom of the second element is introduced per unit of time for at least two atoms of the first element introduced per unit of time. The second element is preferably introduced in at least one confined flow.