Method and system for manufacturing an integrated circuit in consideration of a local layout effect

A method of manufacturing an integrated circuit (IC) including instances of standard cells includes arranging a first instance and arranging a second instance adjacent to the first instance. The second instance has a front-end layer pattern corresponding to a context group of the first instance. The...

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Bibliographische Detailangaben
Hauptverfasser:	Kim, Hyung-Ock, Heo, Sun Ik, Kim, Eunbyeol, Kim, Jaehoon, Ha, Naya, Kim, Ki-Ok, Choi, Jung Yun, Kim, Wootae
Format:	Patent
Sprache:	eng
Schlagworte:	CONTROL OR REGULATING SYSTEMS IN GENERAL CONTROLLING FUNCTIONAL ELEMENTS OF SUCH SYSTEMS MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS PHYSICS REGULATING
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Beschreibung
Zusammenfassung:	A method of manufacturing an integrated circuit (IC) including instances of standard cells includes arranging a first instance and arranging a second instance adjacent to the first instance. The second instance has a front-end layer pattern corresponding to a context group of the first instance. The context group includes information about front-end layer patterns of instances, the front-end layer patterns causing a same local layout effect (LLE) on the first instance and arranged adjacent to the first instance.