Lithographic apparatus and method

A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under th...

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Bibliographische Detailangaben
Hauptverfasser:	Laurent, Thibault Simon Mathieu, Kunnen, Johan Gertrudis Cornelis, Badie, Ramin, Lafarre, Raymond Wilhelmus Louis, Knarren, Bastiaan Andreas Wilhelmus Hubertus, Steffens, Koen, Kusters, Gerardus Adrianus Antonius Maria, Kaneko, Takeshi, Corcoran, Gregory Martin Mason, Jan Voogd, Robbert, Bloks, Ruud Hendrikus Martinus Johannes
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.