Imprint mold and manufacturing method of the same

An imprint mold includes a substrate; a pattern on the substrate and having a multi-layered structure; and an etch stop layer between an upper layer and a lower layer of the pattern.

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Bibliographische Detailangaben
Hauptverfasser:	Kim, Chul-Ho, Choi, Sung-Woo, Kook, Yun-Ho
Format:	Patent
Sprache:	eng
Schlagworte:	AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR SHAPING OR JOINING OF PLASTICS TRANSPORTING WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
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Beschreibung
Zusammenfassung:	An imprint mold includes a substrate; a pattern on the substrate and having a multi-layered structure; and an etch stop layer between an upper layer and a lower layer of the pattern.