Beam delivery apparatus and method

A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one...

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Bibliographische Detailangaben
Hauptverfasser:	Renkens, Michael Jozef Mathijs, Banine, Vadim Yevgenyevich, Engelen, Wouter Joep, Nienhuys, Han-Kwang, Nikipelov, Andrey Alexandrovich, Grimminck, Leonardus Adrianus Gerardus, Katalenic, Andelko, Janssen, Franciscus Johannes Joseph, De Jager, Pieter Willem Herman, Van Gorkom, Ramon Pascal, Donker, Rilpho Ludovicus, Loopstra, Erik Roelof, Bartraij, Petrus Rutgerus, Kruizinga, Borgert, Ament, Lucas Johannes Peter, De Vries, Gosse Charles, Frijns, Olav Waldemar Vladimir
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY GAMMA RAY OR X-RAY MICROSCOPES HOLOGRAPHY IRRADIATION DEVICES MATERIALS THEREFOR NUCLEAR ENGINEERING NUCLEAR PHYSICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR
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Beschreibung
Zusammenfassung:	A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools.