Nanoimprint lithography system and method

A method for transferring a pattern from a template to a nanoimprint object. A perimeter portion of the nanoimprint object is supported by a perimeter support structure. A gas pressure induced force is applied to the nanoimprint object to facilitate bending of a central portion of the nanoimprint ob...

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Bibliographische Detailangaben
Hauptverfasser:	Curts, Kyle Justin, Colburn, Matthew E
Format:	Patent
Sprache:	eng
Schlagworte:	AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR SHAPING OR JOINING OF PLASTICS TRANSPORTING WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
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Beschreibung
Zusammenfassung:	A method for transferring a pattern from a template to a nanoimprint object. A perimeter portion of the nanoimprint object is supported by a perimeter support structure. A gas pressure induced force is applied to the nanoimprint object to facilitate bending of a central portion of the nanoimprint object in a direction toward a surface of the template until the central portion of the nanoimprint object is brought into contact with the surface of the template. While the nanoimprint object is held in contact with the surface of the template, the pattern from the template is transferred to a surface of the nanoimprint object thereby creating a patterned surface on the nanoimprint object.