Pattern formation method and article manufacturing method

A method of forming a pattern on a substrate includes forming a group of first patterns so as to define a first region on each of a plurality of substrates by using a projection exposure apparatus, and forming a group of second patterns so as to define a second region on the first region of each of...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Hayashi, Tatsuya, Emoto, Keiji
Format: Patent
Sprache:eng
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Zusammenfassung:A method of forming a pattern on a substrate includes forming a group of first patterns so as to define a first region on each of a plurality of substrates by using a projection exposure apparatus, and forming a group of second patterns so as to define a second region on the first region of each of substrates different from each other out of the plurality of substrates by using a plurality of imprint apparatuses. A plurality of second regions, which are respectively defined by the plurality of imprint apparatuses in the forming the group of second patterns, are different in shape but have a common component. In the forming the group of first patterns, the first regions are deformed in accordance with the common component.