Lithography apparatus, a method of manufacturing a device and a control program
An immersion lithography apparatus has a controller configured to control a substrate table to move along an exposure route including in order: an entry motion in which the substrate moves from an off-substrate position at which the immersion space does not overlap the substrate to an on-substrate p...
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| creator | Wouters, Marijn Eummelen, Erik Henricus Egidius Catharina Kox, Ronald Frank Blanco Carballo, Victor Manuel Vieyra Salas, Jorge Alberto Scholten, Bert Dirk Custers, Rolf Hendrikus Jacobus De Groot, Casper Roderik Phillips, David Merritt Van der Zanden, Frederik Antonius Van de Vijver, Yuri Johannes Gabriël Van den Nieuwelaar, Norbertus Josephus Martinus Gunter, Pieter Lein Joseph |
| description | An immersion lithography apparatus has a controller configured to control a substrate table to move along an exposure route including in order: an entry motion in which the substrate moves from an off-substrate position at which the immersion space does not overlap the substrate to an on-substrate position at which the immersion space at least partially overlaps the substrate, a transfer motion in which the substrate table changes speed and/or direction and moves for at least a transfer time after the substrate moves to the on-substrate position, and an expose motion in which the substrate is scanned and the patterned beam is projected onto the substrate, wherein throughout the transfer motion at least a part of the immersion space overlaps the substrate and wherein the patterned beam is not projected onto the substrate during the entry motion and the transfer motion. |
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CALCULATING ; CINEMATOGRAPHY ; COMPUTING ; COUNTING ; ELECTRIC DIGITAL DATA PROCESSING ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS ; OPTICS ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2020</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20200114&DB=EPODOC&CC=US&NR=10534270B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20200114&DB=EPODOC&CC=US&NR=10534270B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Wouters, Marijn</creatorcontrib><creatorcontrib>Eummelen, Erik Henricus Egidius Catharina</creatorcontrib><creatorcontrib>Kox, Ronald Frank</creatorcontrib><creatorcontrib>Blanco Carballo, Victor Manuel</creatorcontrib><creatorcontrib>Vieyra Salas, Jorge Alberto</creatorcontrib><creatorcontrib>Scholten, Bert Dirk</creatorcontrib><creatorcontrib>Custers, Rolf Hendrikus Jacobus</creatorcontrib><creatorcontrib>De Groot, Casper Roderik</creatorcontrib><creatorcontrib>Phillips, David Merritt</creatorcontrib><creatorcontrib>Van der Zanden, Frederik Antonius</creatorcontrib><creatorcontrib>Van de Vijver, Yuri Johannes Gabriël</creatorcontrib><creatorcontrib>Van den Nieuwelaar, Norbertus Josephus Martinus</creatorcontrib><creatorcontrib>Gunter, Pieter Lein Joseph</creatorcontrib><title>Lithography apparatus, a method of manufacturing a device and a control program</title><description>An immersion lithography apparatus has a controller configured to control a substrate table to move along an exposure route including in order: an entry motion in which the substrate moves from an off-substrate position at which the immersion space does not overlap the substrate to an on-substrate position at which the immersion space at least partially overlaps the substrate, a transfer motion in which the substrate table changes speed and/or direction and moves for at least a transfer time after the substrate moves to the on-substrate position, and an expose motion in which the substrate is scanned and the patterned beam is projected onto the substrate, wherein throughout the transfer motion at least a part of the immersion space overlaps the substrate and wherein the patterned beam is not projected onto the substrate during the entry motion and the transfer motion.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CALCULATING</subject><subject>CINEMATOGRAPHY</subject><subject>COMPUTING</subject><subject>COUNTING</subject><subject>ELECTRIC DIGITAL DATA PROCESSING</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</subject><subject>OPTICS</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2020</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZPD3ySzJyE8vSizIqFRILChILEosKS3WUUhUyE0FSqQo5Kcp5CbmlaYlJpeUFmXmpQNlUlLLMpNTFRLzUoCc5Py8kqL8HIWCIpApuTwMrGmJOcWpvFCam0HRzTXE2UM3tSA_PrW4IDE5NS-1JD402NDA1NjEyNzAyciYGDUAQIo2xw</recordid><startdate>20200114</startdate><enddate>20200114</enddate><creator>Wouters, Marijn</creator><creator>Eummelen, Erik Henricus Egidius Catharina</creator><creator>Kox, Ronald Frank</creator><creator>Blanco Carballo, Victor Manuel</creator><creator>Vieyra Salas, Jorge Alberto</creator><creator>Scholten, Bert Dirk</creator><creator>Custers, Rolf Hendrikus Jacobus</creator><creator>De Groot, Casper Roderik</creator><creator>Phillips, David Merritt</creator><creator>Van der Zanden, Frederik Antonius</creator><creator>Van de Vijver, Yuri Johannes Gabriël</creator><creator>Van den Nieuwelaar, Norbertus Josephus Martinus</creator><creator>Gunter, Pieter Lein Joseph</creator><scope>EVB</scope></search><sort><creationdate>20200114</creationdate><title>Lithography apparatus, a method of manufacturing a device and a control program</title><author>Wouters, Marijn ; 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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CALCULATING CINEMATOGRAPHY COMPUTING COUNTING ELECTRIC DIGITAL DATA PROCESSING ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | Lithography apparatus, a method of manufacturing a device and a control program |
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