Method of manufacturing sputtering target and sputtering target

The manufacturing cost of a sputtering target is reduced and the impurity concentration of the manufactured sputtering target is also reduced. A method of manufacturing a sputtering target includes: surface-treating at least one of a used sputtering target and a scrap material; melting at least one...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Nakashima, Nobuaki, Komatsu, Tooru
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:The manufacturing cost of a sputtering target is reduced and the impurity concentration of the manufactured sputtering target is also reduced. A method of manufacturing a sputtering target includes: surface-treating at least one of a used sputtering target and a scrap material; melting at least one of the used sputtering target and the scrap material after the surface treatment to form an ingot; and manufacturing a sputtering target by subjecting the ingot to forging, rolling, heat treating, and machining.