Manufacturing method for thin film transistor array substrate

A manufacturing method for a thin film transistor array substrate is provided. The method includes steps of depositing a first photoresist layer on a substrate before depositing the active metal layer; removing the first photoresist layer on a surface of the gate layer from the active metal by a rem...

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Bibliographische Detailangaben
Hauptverfasser:	Lu, Poyen, Fang, Chunhsiung
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FREQUENCY-CHANGING NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL LOGIC ELEMENTS OPTICS PHYSICS SEMICONDUCTOR DEVICES TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF
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Beschreibung
Zusammenfassung:	A manufacturing method for a thin film transistor array substrate is provided. The method includes steps of depositing a first photoresist layer on a substrate before depositing the active metal layer; removing the first photoresist layer on a surface of the gate layer from the active metal by a removing process after exposing and developing the first photoresist layer, so that a surface of the gate layer is not covered by the active metal; chemically reacting the active metal with a portion of the active layer by a predetermined process.