Classification, search and retrieval of semiconductor processing metrology images using deep learning/convolutional neural networks

A method of classifying substrates with a metrology tool is herein disclosed. The method begins by training a deep learning framework using convolutional neural networks with a training dataset for classifying image dataset. Obtaining a new image from the meteorology tool. Running the new image thro...

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Bibliographische Detailangaben
Hauptverfasser: Gayaka, Shreekant, Bhaviripudi, Sreekar
Format: Patent
Sprache:eng
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Zusammenfassung:A method of classifying substrates with a metrology tool is herein disclosed. The method begins by training a deep learning framework using convolutional neural networks with a training dataset for classifying image dataset. Obtaining a new image from the meteorology tool. Running the new image through the deep learning framework to classify the new image.