Charged-particle microscope with in situ deposition functionality

A charged-particle microscope M, comprising a vacuum chamber in which are provided: - A specimen holder 7 for holding a specimen in an irradiation position Pi; - A particle-optical column 1;31, for producing a charged particle beam 3';33 and directing it so as to irradiate the specimen; - A det...

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Bibliographische Detailangaben
Hauptverfasser:	Mitchels, John, Hrouzek, Michal, Gardelka, Tomas, Schampers, Rudolf Johannes Peter Gerardus
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	A charged-particle microscope M, comprising a vacuum chamber in which are provided: - A specimen holder 7 for holding a specimen in an irradiation position Pi; - A particle-optical column 1;31, for producing a charged particle beam 3';33 and directing it so as to irradiate the specimen; - A detector 19, for detecting a flux of radiation emanating from the specimen in response to irradiation by said beam, wherein: - Said vacuum chamber comprises an in situ magnetron sputter deposition module D, comprising a magnetron sputter source for producing a vapor stream of target material; - A stage 7,7' is configured to move a sample comprising at least part of said specimen between said irradiation position and a separate deposition position Pd at said deposition module; - Said deposition module is configured to deposit a layer of said target material onto said sample when held at said deposition position.