Coating film, manufacturing method for same, and PVD device

Provided are a coating film, a manufacturing method for the same, and a PVD device that not only sufficiently improve the balance of low-friction properties and wear resistance, but also improve chipping resistance and peeling resistance. This film is coated on a substrate surface, wherein the coati...

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Hauptverfasser: Ogawa, Katsuaki, Okazaki, Takahiro, Saito, Tadashi, Moriguchi, Hideki, Ito, Yoshihiro, Tanaka, Yoshikazu, Arahi, Tetsumi, Sugiura, Hiroyuki, Shibata, Akinori
Format: Patent
Sprache:eng
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Zusammenfassung:Provided are a coating film, a manufacturing method for the same, and a PVD device that not only sufficiently improve the balance of low-friction properties and wear resistance, but also improve chipping resistance and peeling resistance. This film is coated on a substrate surface, wherein the coating film has a hard carbon that presents relatively black and white when observed in a cross-sectional bright-field TEM image, a mesh-shaped hard carbon layer is formed using a PVD method, said layer having white-colored hard carbon in a mesh shape extending in the thickness direction and black-colored hard carbon dispersed into the cavities in the mesh, and the ID/IG ratio is 1-6 when the mesh-shaped hard carbon layer is measured using Raman spectroscopy, said ratio being the ratio of the Raman spectrum D band peak area intensity and G band peak area intensity.