Method and apparatus for purifying target material for EUV light source
A deoxidation system for purifying target material for an EUV light source includes a furnace having a central region and a heater for heating the central region in a uniform manner. A vessel is inserted in the central region of the furnace, and a crucible is disposed within the vessel. A closure de...
Gespeichert in:
| Hauptverfasser: | , , , , , |
|---|---|
| Format: | Patent |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | Sams, Benjamin Ridinger, Armin Vaschenko, Georgiy Rajyaguru, Chirag Baumgart, Peter Kardokus, Janine |
| description | A deoxidation system for purifying target material for an EUV light source includes a furnace having a central region and a heater for heating the central region in a uniform manner. A vessel is inserted in the central region of the furnace, and a crucible is disposed within the vessel. A closure device covers an open end of the vessel to form a seal having vacuum and pressure capability. The system also includes a gas input tube, a gas exhaust tube, and a vacuum port. A gas supply network is coupled in flow communication with an end of the gas input tube and a gas supply network is coupled in flow communication with an end of the gas exhaust tube. A vacuum network is coupled in flow communication with one end of the vacuum port. A method and apparatus for purifying target material also are described. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US10455680B2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US10455680B2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US10455680B23</originalsourceid><addsrcrecordid>eNrjZHD3TS3JyE9RSMwD4oKCxKLEktJihbT8IoWC0qLMtMrMvHSFksSi9NQShdzEktSizMQcsKxraJhCTmZ6RolCcX5pUXIqDwNrWmJOcSovlOZmUHRzDXH20E0tyI9PLS5ITE7NSy2JDw02NDAxNTWzMHAyMiZGDQBVczPb</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Method and apparatus for purifying target material for EUV light source</title><source>esp@cenet</source><creator>Sams, Benjamin ; Ridinger, Armin ; Vaschenko, Georgiy ; Rajyaguru, Chirag ; Baumgart, Peter ; Kardokus, Janine</creator><creatorcontrib>Sams, Benjamin ; Ridinger, Armin ; Vaschenko, Georgiy ; Rajyaguru, Chirag ; Baumgart, Peter ; Kardokus, Janine</creatorcontrib><description>A deoxidation system for purifying target material for an EUV light source includes a furnace having a central region and a heater for heating the central region in a uniform manner. A vessel is inserted in the central region of the furnace, and a crucible is disposed within the vessel. A closure device covers an open end of the vessel to form a seal having vacuum and pressure capability. The system also includes a gas input tube, a gas exhaust tube, and a vacuum port. A gas supply network is coupled in flow communication with an end of the gas input tube and a gas supply network is coupled in flow communication with an end of the gas exhaust tube. A vacuum network is coupled in flow communication with one end of the vacuum port. A method and apparatus for purifying target material also are described.</description><language>eng</language><subject>BLASTING ; CHEMISTRY ; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; FERROUS OR NON-FERROUS ALLOYS ; FURNACES ; FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL ; HEATING ; KILNS ; LIGHTING ; MECHANICAL ENGINEERING ; METALLURGY ; OPEN SINTERING OR LIKE APPARATUS ; OVENS ; PRETREATMENT OF RAW MATERIALS ; PRODUCTION AND REFINING OF METALS ; RETORTS ; TREATMENT OF ALLOYS OR NON-FERROUS METALS ; WEAPONS ; X-RAY TECHNIQUE</subject><creationdate>2019</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20191022&DB=EPODOC&CC=US&NR=10455680B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20191022&DB=EPODOC&CC=US&NR=10455680B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Sams, Benjamin</creatorcontrib><creatorcontrib>Ridinger, Armin</creatorcontrib><creatorcontrib>Vaschenko, Georgiy</creatorcontrib><creatorcontrib>Rajyaguru, Chirag</creatorcontrib><creatorcontrib>Baumgart, Peter</creatorcontrib><creatorcontrib>Kardokus, Janine</creatorcontrib><title>Method and apparatus for purifying target material for EUV light source</title><description>A deoxidation system for purifying target material for an EUV light source includes a furnace having a central region and a heater for heating the central region in a uniform manner. A vessel is inserted in the central region of the furnace, and a crucible is disposed within the vessel. A closure device covers an open end of the vessel to form a seal having vacuum and pressure capability. The system also includes a gas input tube, a gas exhaust tube, and a vacuum port. A gas supply network is coupled in flow communication with an end of the gas input tube and a gas supply network is coupled in flow communication with an end of the gas exhaust tube. A vacuum network is coupled in flow communication with one end of the vacuum port. A method and apparatus for purifying target material also are described.</description><subject>BLASTING</subject><subject>CHEMISTRY</subject><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>FERROUS OR NON-FERROUS ALLOYS</subject><subject>FURNACES</subject><subject>FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL</subject><subject>HEATING</subject><subject>KILNS</subject><subject>LIGHTING</subject><subject>MECHANICAL ENGINEERING</subject><subject>METALLURGY</subject><subject>OPEN SINTERING OR LIKE APPARATUS</subject><subject>OVENS</subject><subject>PRETREATMENT OF RAW MATERIALS</subject><subject>PRODUCTION AND REFINING OF METALS</subject><subject>RETORTS</subject><subject>TREATMENT OF ALLOYS OR NON-FERROUS METALS</subject><subject>WEAPONS</subject><subject>X-RAY TECHNIQUE</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2019</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHD3TS3JyE9RSMwD4oKCxKLEktJihbT8IoWC0qLMtMrMvHSFksSi9NQShdzEktSizMQcsKxraJhCTmZ6RolCcX5pUXIqDwNrWmJOcSovlOZmUHRzDXH20E0tyI9PLS5ITE7NSy2JDw02NDAxNTWzMHAyMiZGDQBVczPb</recordid><startdate>20191022</startdate><enddate>20191022</enddate><creator>Sams, Benjamin</creator><creator>Ridinger, Armin</creator><creator>Vaschenko, Georgiy</creator><creator>Rajyaguru, Chirag</creator><creator>Baumgart, Peter</creator><creator>Kardokus, Janine</creator><scope>EVB</scope></search><sort><creationdate>20191022</creationdate><title>Method and apparatus for purifying target material for EUV light source</title><author>Sams, Benjamin ; Ridinger, Armin ; Vaschenko, Georgiy ; Rajyaguru, Chirag ; Baumgart, Peter ; Kardokus, Janine</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US10455680B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2019</creationdate><topic>BLASTING</topic><topic>CHEMISTRY</topic><topic>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>FERROUS OR NON-FERROUS ALLOYS</topic><topic>FURNACES</topic><topic>FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL</topic><topic>HEATING</topic><topic>KILNS</topic><topic>LIGHTING</topic><topic>MECHANICAL ENGINEERING</topic><topic>METALLURGY</topic><topic>OPEN SINTERING OR LIKE APPARATUS</topic><topic>OVENS</topic><topic>PRETREATMENT OF RAW MATERIALS</topic><topic>PRODUCTION AND REFINING OF METALS</topic><topic>RETORTS</topic><topic>TREATMENT OF ALLOYS OR NON-FERROUS METALS</topic><topic>WEAPONS</topic><topic>X-RAY TECHNIQUE</topic><toplevel>online_resources</toplevel><creatorcontrib>Sams, Benjamin</creatorcontrib><creatorcontrib>Ridinger, Armin</creatorcontrib><creatorcontrib>Vaschenko, Georgiy</creatorcontrib><creatorcontrib>Rajyaguru, Chirag</creatorcontrib><creatorcontrib>Baumgart, Peter</creatorcontrib><creatorcontrib>Kardokus, Janine</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Sams, Benjamin</au><au>Ridinger, Armin</au><au>Vaschenko, Georgiy</au><au>Rajyaguru, Chirag</au><au>Baumgart, Peter</au><au>Kardokus, Janine</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Method and apparatus for purifying target material for EUV light source</title><date>2019-10-22</date><risdate>2019</risdate><abstract>A deoxidation system for purifying target material for an EUV light source includes a furnace having a central region and a heater for heating the central region in a uniform manner. A vessel is inserted in the central region of the furnace, and a crucible is disposed within the vessel. A closure device covers an open end of the vessel to form a seal having vacuum and pressure capability. The system also includes a gas input tube, a gas exhaust tube, and a vacuum port. A gas supply network is coupled in flow communication with an end of the gas input tube and a gas supply network is coupled in flow communication with an end of the gas exhaust tube. A vacuum network is coupled in flow communication with one end of the vacuum port. A method and apparatus for purifying target material also are described.</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng |
| recordid | cdi_epo_espacenet_US10455680B2 |
| source | esp@cenet |
| subjects | BLASTING CHEMISTRY ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY FERROUS OR NON-FERROUS ALLOYS FURNACES FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL HEATING KILNS LIGHTING MECHANICAL ENGINEERING METALLURGY OPEN SINTERING OR LIKE APPARATUS OVENS PRETREATMENT OF RAW MATERIALS PRODUCTION AND REFINING OF METALS RETORTS TREATMENT OF ALLOYS OR NON-FERROUS METALS WEAPONS X-RAY TECHNIQUE |
| title | Method and apparatus for purifying target material for EUV light source |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-20T02%3A16%3A31IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=Sams,%20Benjamin&rft.date=2019-10-22&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS10455680B2%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |