Reactor filament assembly with enhanced misalignment tolerance

A tubular filament assembly for a CVD silicon deposition reactor is disclosed that provides consistent, low resistance connections to vertical tubular filaments by forming slidable connections between upper and/or lower ends of the tubular filaments and shaped elements cooperative with the bridge an...

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Bibliographische Detailangaben
Hauptverfasser:	Rhodes, Aaron D, Ballenger, Keith H
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COMPOUNDS THEREOF DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL INORGANIC CHEMISTRY METALLURGY NON-METALLIC ELEMENTS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	A tubular filament assembly for a CVD silicon deposition reactor is disclosed that provides consistent, low resistance connections to vertical tubular filaments by forming slidable connections between upper and/or lower ends of the tubular filaments and shaped elements cooperative with the bridge and/or the support chucks, so that the connections are insensitive at least to small variations in tilt angle of the vertical filaments and/or the horizontal bridge. The shaped elements can be incorporated into or separate and cooperative with the bridge and/or the chucks. Various embodiments are described.