Gas separation membrane, method of producing gas separation membrane, gas separation membrane module, and gas separator

Gas separation membrane, method of producing gas separation membrane, gas separation membrane module, and gas separator

In the expressions, A represents an O/Si ratio that is a ratio of the number of oxygen atoms relative to the number of silicon atoms contained in the resin layer containing a compound having a siloxane bond at a depth of 10 nm from the surface of the resin layer containing a compound having a siloxa...

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Bibliographische Detailangaben
Hauptverfasser: Narita, Takeshi, Itou, Shigehide, Mochizuki, Yusuke, Noda, Hiroyuki, Mukai, Atsushi, Sawada, Makoto
Format: Patent
Sprache:eng
Schlagworte:
PERFORMING OPERATIONS
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
SEPARATION
TRANSPORTING
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Beschreibung
Zusammenfassung:In the expressions, A represents an O/Si ratio that is a ratio of the number of oxygen atoms relative to the number of silicon atoms contained in the resin layer containing a compound having a siloxane bond at a depth of 10 nm from the surface of the resin layer containing a compound having a siloxane bond, and B represents an O/Si ratio that is a ratio of the number of oxygen atoms relative to the number of silicon atoms in the surface of the resin layer containing a compound having a siloxane bond.