Integrated circuit device

An integrated circuit device includes a base burying insulating film covering a lower side wall of a fin-type active region on a substrate, an isolation pattern having a top surface higher than a top surface of the base burying insulating film, and a gate line covering a channel section of the fin-t...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Whang, Sung-man, Kim, Mun-hyeon, Kim, Dong-won, Noh, Chang-woo, Oh, Han-su
Format: Patent
Sprache:eng
Schlagworte:
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