Method of cleaning a substrate and apparatus for performing the same

In a method of cleaning a substrate, a protecting liquid may be sprayed to a surface of the substrate from a first position in a first spray direction. Cleaning droplets may be injected on to the surface of the substrate. The protecting liquid may be sprayed to the surface of the substrate from a se...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Lee, Hyo-San, Kim, Kyoung-Seob, Kim, Seok-Hoon, Kim, Dong-Chul
Format: Patent
Sprache:eng
Schlagworte:
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Beschreibung
Zusammenfassung:In a method of cleaning a substrate, a protecting liquid may be sprayed to a surface of the substrate from a first position in a first spray direction. Cleaning droplets may be injected on to the surface of the substrate. The protecting liquid may be sprayed to the surface of the substrate from a second position different from the first position in a second spray direction. For example, the protecting liquid may be always sprayed from the central portion toward the edge portions in the substrate so that the protecting liquid on the substrate may have a uniform thickness.