Ultraviolet disinfection system

Embodiments of the invention include an elongate chamber. A UV source includes a semiconductor device, the semiconductor device including an active layer disposed between an n-type region and a p-type region. The active layer emits radiation having a peak wavelength in a UV range. The semiconductor...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Liao, Yitao, West, Robert S, Collins, Douglas A
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:Embodiments of the invention include an elongate chamber. A UV source includes a semiconductor device, the semiconductor device including an active layer disposed between an n-type region and a p-type region. The active layer emits radiation having a peak wavelength in a UV range. The semiconductor device is positioned on a wall of the elongate chamber. An inner surface of the elongate chamber is reflective.