Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask composition

A monomer for a hardmask composition is represented by the following Chemical Formula 1,

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Bibliographische Detailangaben
Hauptverfasser:	Shin, Seung-Wook, Song, Hyun-Ji, Park, Yu-Shin, Park, Yo-Choul, Kim, Hea-Jung, Moon, Joon-Young, Hong, Seung-Hee, Park, You-Jung, Kim, Young-Min, Kim, Go-Un, Lee, Chung-Heon, Choi, Yoo-Jeong, Kim, Yun-Jun, Yoon, Yong-Woon
Format:	Patent
Sprache:	eng
Schlagworte:	ACYCLIC OR CARBOCYCLIC COMPOUNDS APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY ELECTROGRAPHY HETEROCYCLIC COMPOUNDS HOLOGRAPHY MATERIALS THEREFOR METALLURGY ORGANIC CHEMISTRY ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A monomer for a hardmask composition is represented by the following Chemical Formula 1,