Method for producing a lens for a lithography apparatus, and measurement system

A method for producing a lens for a lithography apparatus is disclosed. A measurement system for ascertaining an optical characteristic of a partial lens for a lithography apparatus is also disclosed.

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Bibliographische Detailangaben
Hauptverfasser:	Fritzsche, Steffen, Baier, Juergen, Freimann, Rolf
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR MEASURING OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TESTING TESTING STATIC OR DYNAMIC BALANCE OF MACHINES ORSTRUCTURES TESTING STRUCTURES OR APPARATUS NOT OTHERWISE PROVIDED FOR
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Beschreibung
Zusammenfassung:	A method for producing a lens for a lithography apparatus is disclosed. A measurement system for ascertaining an optical characteristic of a partial lens for a lithography apparatus is also disclosed.