Method and device for grooving wafers

a recess profile measuring device (180) arranged at a predetermined distance behind the beam directing device in the radiation beam displacement direction effected by the wafer table displacement drive for measuring a depth profile of the recess that has been formed by the radiation beam.

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Bibliographische Detailangaben
Hauptverfasser: Van Lieshout, Richard, Knippels, Guido
Format: Patent
Sprache:eng
Schlagworte:
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Beschreibung
Zusammenfassung:a recess profile measuring device (180) arranged at a predetermined distance behind the beam directing device in the radiation beam displacement direction effected by the wafer table displacement drive for measuring a depth profile of the recess that has been formed by the radiation beam.