Reducing electric charge in imprint lithography

Methods and systems for contacting a polymerizable material on a surface of a substrate with a patterning surface of a template; curing the polymerizable material in a working environment, comprising a first gas, the working environment proximate to the surface of the substrate; after introducing a...

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1. Verfasser: Khusnatdinov, Niyaz
Format: Patent
Sprache:eng
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Zusammenfassung:Methods and systems for contacting a polymerizable material on a surface of a substrate with a patterning surface of a template; curing the polymerizable material in a working environment, comprising a first gas, the working environment proximate to the surface of the substrate; after introducing a second gas into the working environment, separating the patterning surface of the template and the surface of the substrate to achieve at least a particular distance between the patterning surface and the surface of the substrate; and after achieving the particular distance, introducing a third gas into the working environment, wherein, for a given pressure of the working environment, the second gas has a breakdown voltage less than that of the first gas up to the particular distance, and the third gas has a breakdown voltage less than that of the second gas at distances greater than the particular distance.