System and method to generate schematics from layout-fabrics with a common cross-fabric model

Embodiments include herein are directed towards a method for use in an electronic design environment is provided. The method may include receiving, using a processor, a parent fabric corresponding to a top layout fabric associated with an electronic design and receiving a child fabric corresponding...

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Bibliographische Detailangaben
Hauptverfasser: Kukal, Taranjit Singh, Durrill, Steven Roberts, Ginetti, Arnold Jean Marie Gustave
Format: Patent
Sprache:eng
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Zusammenfassung:Embodiments include herein are directed towards a method for use in an electronic design environment is provided. The method may include receiving, using a processor, a parent fabric corresponding to a top layout fabric associated with an electronic design and receiving a child fabric corresponding to a child layout fabric associated with the electronic design. The method may further include receiving an electromagnetic ("EM") model that represents one or more cross-fabric geometries associated with the electronic design and generating a hierarchical schematic representing each layout fabric, wherein the EM model is inserted into a parent schematic. The method may also include managing one or more interface connections between the hierarchical schematic.