System and method to generate schematics from layout-fabrics with a common cross-fabric model
Embodiments include herein are directed towards a method for use in an electronic design environment is provided. The method may include receiving, using a processor, a parent fabric corresponding to a top layout fabric associated with an electronic design and receiving a child fabric corresponding...
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | Embodiments include herein are directed towards a method for use in an electronic design environment is provided. The method may include receiving, using a processor, a parent fabric corresponding to a top layout fabric associated with an electronic design and receiving a child fabric corresponding to a child layout fabric associated with the electronic design. The method may further include receiving an electromagnetic ("EM") model that represents one or more cross-fabric geometries associated with the electronic design and generating a hierarchical schematic representing each layout fabric, wherein the EM model is inserted into a parent schematic. The method may also include managing one or more interface connections between the hierarchical schematic. |
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