Diagnosing an abnormal state of a substrate-processing apparatus

A method of diagnosing an abnormal state of a substrate-processing apparatus includes measuring a temperature of a chuck in the substrate-processing apparatus. The temperature of the chuck is compared to a target temperature of the chuck, with a temperature-controlling unit. A control signal is anal...

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Bibliographische Detailangaben
Hauptverfasser: Soh, Sang-Yoon, Jung, Dae-Sung, Um, Jung-Hwan
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A method of diagnosing an abnormal state of a substrate-processing apparatus includes measuring a temperature of a chuck in the substrate-processing apparatus. The temperature of the chuck is compared to a target temperature of the chuck, with a temperature-controlling unit. A control signal is analyzed to diagnose an abnormal state of the substrate-processing apparatus. The control signal is transmitted from the temperature-controlling unit to a drive parameter-applying unit configured to provide the chuck with a drive parameter.