Structure, production method thereof, and article provided with said structure

A structure with a substrate, and a fine-unevenness-structure layer provided to at least one surface of the substrate, wherein the fine-unevenness-structure layer is disposed at a surface of the structure, the indentation elastic modulus of the structure is 1-1300 MPa, and the ratio (Δμ) of the rate...

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Bibliographische Detailangaben
Hauptverfasser:	Nakai, Yusuke, Fujiyama, Kousuke, Mori, Seiichiro, Otani, Go, Jigami, Tetsuya
Format:	Patent
Sprache:	eng
Schlagworte:	AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING APPARATUS THEREFOR CASTING CHEMISTRY ELECTROFORMING ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOUNDRY MOULDING INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULARARTICLES INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES LAYERED PRODUCTS LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM MEASURING METALLURGY OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS PERFORMING OPERATIONS PHYSICS POWDER METALLURGY PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR SHAPING OR JOINING OF PLASTICS TESTING TRANSPORTING WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
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Beschreibung
Zusammenfassung:	A structure with a substrate, and a fine-unevenness-structure layer provided to at least one surface of the substrate, wherein the fine-unevenness-structure layer is disposed at a surface of the structure, the indentation elastic modulus of the structure is 1-1300 MPa, and the ratio (Δμ) of the rate of change of the coefficient of kinetic friction of the surface of the structure is 0.15-1.05, wherein Δμ=Δμf/Δμs: Δμs represents the rate of change of the coefficient of kinetic friction of the surface of the structure at an initial-abrasion stage of a reciprocating abrasion test; and Δμf represents the rate of change of the coefficient of kinetic friction of the surface of the structure immediately prior to the end of the reciprocating abrasion test. This structure exhibits excellent scratch resistance without compromising on the optical performance thereof, such as the antireflection performance.