Lithographic apparatus and device manufacturing method involving a heater

A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a substrate temperature control system configured to provide a control signal to control a substrate t...

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Bibliographische Detailangaben
Hauptverfasser:	Boom, Herman, Ten Kate, Nicolaas, De Mol, Christianus Gerardus Maria, Quaedackers, Johannes Anna, De Jong, Frederik Eduard, Nihtianov, Stoyan, Riepen, Michel, Mertens, Jeroen Johannes Sophia Maria, Loopstra, Erik Roelof, Moerman, Richard, Menchtchikov, Boris, Van Meer, Aschwin Lodewijk Hendricus Johannes, Goorman, Koen, Cadee, Theodorus Petrus Maria, Stavenga, Marco Koert, Tinnemans, Patricius Aloysius Jacobus, Verspay, Jacobus Johannus Leonardus Hendricus, Jacobs, Johannes Henricus Wilhelmus, Reuhman-Huisken, Maria Elisabeth, Verhagen, Martinus Cornelis Maria, Smeets, Martin Frans Pierre, Schoondermark, Bart Leonard Peter, Van Der Net, Antonius Johannus, Janssen, Franciscus Johannes Joseph, Ottens, Joost Jeroen, Muitjens, Marcel Johannus Elisabeth Hubertus
Format:	Patent
Sprache:	eng
Schlagworte:	ACCESSORIES THEREFOR APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a substrate temperature control system configured to provide a control signal to control a substrate temperature conditioning system based on a determined temperature; and a parameter control system configured to adjust a lithographic apparatus parameter, that is other than, or in addition to, the control signal, based on temperature information of the substrate and/or substrate table or on a measure derived from the temperature information.