Substrate supporting unit, substrate processing apparatus, and method of manufacturing substrate supporting unit

A substrate supporting unit, a substrate processing apparatus, and a method of manufacturing the substrate supporting unit are provided. The substrate supporting unit includes a susceptor provided with heaters to heat a substrate placed on the susceptor, and including a first temperature region and...

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Bibliographische Detailangaben
Hauptverfasser: Yang, Il-Kwang, Je, Sung-Tae, Chu, Kyung-Jin, Lee, Dong-Keun
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A substrate supporting unit, a substrate processing apparatus, and a method of manufacturing the substrate supporting unit are provided. The substrate supporting unit includes a susceptor provided with heaters to heat a substrate placed on the susceptor, and including a first temperature region and a second temperature region having a higher temperature than that of the first temperature region; a heat dissipating member including a contact surface being in thermal contact with the second temperature region; and a reflecting member disposed approximately in parallel with one surface of the susceptor to reflect heat emitted from the susceptor toward the susceptor.