Adaptive processes for improving integrity of surfaces

A process for performing localized corrective actions to structure of an electronic device is described. The structure may include a mating surface configured to receive another structure such that the two structures may be, for example, adhesively bonded together. The localized corrective actions a...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Leggett, William F, Lancaster-Larocque, Simon Regis Louis
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A process for performing localized corrective actions to structure of an electronic device is described. The structure may include a mating surface configured to receive another structure such that the two structures may be, for example, adhesively bonded together. The localized corrective actions are configured not to improve the mating surface but to also prevent light within the electronic device from escaping in undesired areas of the electronic device. In some embodiments, the corrective action includes using a removal tool to remove identified portions of the surface. In other embodiments, the corrective action includes using a different tool to add material identified portions of the surface. The identified means may include an automated inspection system.