Compound objectives for imaging and scatterometry overlay

Objective lenses and corresponding optical systems and metrology tools, as well as methods are provided. Objective lenses comprise a central region conforming to specified imaging requirements and a peripheral region conforming to specified scatterometry requirements. The optical systems may compris...

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Bibliographische Detailangaben
Hauptverfasser:	Paskover, Yuri, Seligson, Joel, Levinski, Vladimir, Manassen, Amnon, Kandel, Daniel, Hill, Andrew V
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MATERIALS THEREFOR MEASURING OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TESTING
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Beschreibung
Zusammenfassung:	Objective lenses and corresponding optical systems and metrology tools, as well as methods are provided. Objective lenses comprise a central region conforming to specified imaging requirements and a peripheral region conforming to specified scatterometry requirements. The optical systems may comprise common-path optical elements configured to handle both imaging and scatterometry signals received through the objective lens. Using a single objective lens simplifies the design of the optical system while maintaining, simultaneously, the performance requirements for imaging as well as for scatterometry.