Imprint apparatus and imprint method

An imprint apparatus according to one embodiment includes a contact processing unit and a defect determination unit. The contact processing unit brings a template pattern formed on a front surface of a template into contact with resist placed on a substrate. The defect determination unit determines...

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Hauptverfasser: Hiroshima, Masahito, Nomura, Hiroshi, Matsuoka, Yasuo
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creator Hiroshima, Masahito
Nomura, Hiroshi
Matsuoka, Yasuo
description An imprint apparatus according to one embodiment includes a contact processing unit and a defect determination unit. The contact processing unit brings a template pattern formed on a front surface of a template into contact with resist placed on a substrate. The defect determination unit determines a defect in an imprint process, on the basis of force which is generated from at least one of the template, the resist, and the substrate, during the imprint process.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US10131135B2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US10131135B2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US10131135B23</originalsourceid><addsrcrecordid>eNrjZFDxzC0oyswrUUgsKEgsSiwpLVZIzEtRyISK5qaWZOSn8DCwpiXmFKfyQmluBkU31xBnD93Ugvz41OKCxOTUvNSS-NBgQwNDY0NDY1MnI2Ni1AAAJownCA</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Imprint apparatus and imprint method</title><source>esp@cenet</source><creator>Hiroshima, Masahito ; Nomura, Hiroshi ; Matsuoka, Yasuo</creator><creatorcontrib>Hiroshima, Masahito ; Nomura, Hiroshi ; Matsuoka, Yasuo</creatorcontrib><description>An imprint apparatus according to one embodiment includes a contact processing unit and a defect determination unit. The contact processing unit brings a template pattern formed on a front surface of a template into contact with resist placed on a substrate. The defect determination unit determines a defect in an imprint process, on the basis of force which is generated from at least one of the template, the resist, and the substrate, during the imprint process.</description><language>eng</language><subject>LINING MACHINES ; PERFORMING OPERATIONS ; PRINTING ; PRINTING MACHINES OR PRESSES ; STAMPS ; TRANSPORTING ; TYPEWRITERS</subject><creationdate>2018</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20181120&amp;DB=EPODOC&amp;CC=US&amp;NR=10131135B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20181120&amp;DB=EPODOC&amp;CC=US&amp;NR=10131135B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Hiroshima, Masahito</creatorcontrib><creatorcontrib>Nomura, Hiroshi</creatorcontrib><creatorcontrib>Matsuoka, Yasuo</creatorcontrib><title>Imprint apparatus and imprint method</title><description>An imprint apparatus according to one embodiment includes a contact processing unit and a defect determination unit. The contact processing unit brings a template pattern formed on a front surface of a template into contact with resist placed on a substrate. The defect determination unit determines a defect in an imprint process, on the basis of force which is generated from at least one of the template, the resist, and the substrate, during the imprint process.</description><subject>LINING MACHINES</subject><subject>PERFORMING OPERATIONS</subject><subject>PRINTING</subject><subject>PRINTING MACHINES OR PRESSES</subject><subject>STAMPS</subject><subject>TRANSPORTING</subject><subject>TYPEWRITERS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2018</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZFDxzC0oyswrUUgsKEgsSiwpLVZIzEtRyISK5qaWZOSn8DCwpiXmFKfyQmluBkU31xBnD93Ugvz41OKCxOTUvNSS-NBgQwNDY0NDY1MnI2Ni1AAAJownCA</recordid><startdate>20181120</startdate><enddate>20181120</enddate><creator>Hiroshima, Masahito</creator><creator>Nomura, Hiroshi</creator><creator>Matsuoka, Yasuo</creator><scope>EVB</scope></search><sort><creationdate>20181120</creationdate><title>Imprint apparatus and imprint method</title><author>Hiroshima, Masahito ; Nomura, Hiroshi ; Matsuoka, Yasuo</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US10131135B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2018</creationdate><topic>LINING MACHINES</topic><topic>PERFORMING OPERATIONS</topic><topic>PRINTING</topic><topic>PRINTING MACHINES OR PRESSES</topic><topic>STAMPS</topic><topic>TRANSPORTING</topic><topic>TYPEWRITERS</topic><toplevel>online_resources</toplevel><creatorcontrib>Hiroshima, Masahito</creatorcontrib><creatorcontrib>Nomura, Hiroshi</creatorcontrib><creatorcontrib>Matsuoka, Yasuo</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Hiroshima, Masahito</au><au>Nomura, Hiroshi</au><au>Matsuoka, Yasuo</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Imprint apparatus and imprint method</title><date>2018-11-20</date><risdate>2018</risdate><abstract>An imprint apparatus according to one embodiment includes a contact processing unit and a defect determination unit. The contact processing unit brings a template pattern formed on a front surface of a template into contact with resist placed on a substrate. The defect determination unit determines a defect in an imprint process, on the basis of force which is generated from at least one of the template, the resist, and the substrate, during the imprint process.</abstract><oa>free_for_read</oa></addata></record>
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subjects LINING MACHINES
PERFORMING OPERATIONS
PRINTING
PRINTING MACHINES OR PRESSES
STAMPS
TRANSPORTING
TYPEWRITERS
title Imprint apparatus and imprint method
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-01T05%3A37%3A21IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=Hiroshima,%20Masahito&rft.date=2018-11-20&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS10131135B2%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true