Imprint apparatus and imprint method
An imprint apparatus according to one embodiment includes a contact processing unit and a defect determination unit. The contact processing unit brings a template pattern formed on a front surface of a template into contact with resist placed on a substrate. The defect determination unit determines...
Gespeichert in:
| Hauptverfasser: | , , |
|---|---|
| Format: | Patent |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| Zusammenfassung: | An imprint apparatus according to one embodiment includes a contact processing unit and a defect determination unit. The contact processing unit brings a template pattern formed on a front surface of a template into contact with resist placed on a substrate. The defect determination unit determines a defect in an imprint process, on the basis of force which is generated from at least one of the template, the resist, and the substrate, during the imprint process. |
|---|