III-V MOSFET with self-aligned diffusion barrier

A field effect transistor is provided which includes a plurality of fins, at least a portion of a given fin including a respective source region, and a raised source disposed at least partially on the fins and including III-V material. The field effect transistor further includes a diffusion barrier...

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Bibliographische Detailangaben
Hauptverfasser: Sun, Yanning, Chu, Jack Oon, Yau, Jeng-Bang, Chan, Kevin K, Cheng, Cheng-Wei
Format: Patent
Sprache:eng
Schlagworte:
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Beschreibung
Zusammenfassung:A field effect transistor is provided which includes a plurality of fins, at least a portion of a given fin including a respective source region, and a raised source disposed at least partially on the fins and including III-V material. The field effect transistor further includes a diffusion barrier disposed at least partially on the raised source and including transition metal bonded with silicon or germanium, and a gate stack capacitively coupled at least to the respective source regions of the fins.