Gas impingement device, recording substrate treatment apparatus and printing system comprising such gas impingement device

A gas impingement device includes a first surface including a pattern of a plurality of gas outlets, the pattern including a number of substantially parallel rows of gas outlets, the rows arranged in a direction, which direction is at a skew angle α with a front edge of the first surface of the gas...

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Bibliographische Detailangaben
Hauptverfasser: Kersten, Stan H. P, Ramackers, Hendrikus G. M
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A gas impingement device includes a first surface including a pattern of a plurality of gas outlets, the pattern including a number of substantially parallel rows of gas outlets, the rows arranged in a direction, which direction is at a skew angle α with a front edge of the first surface of the gas impingement device. A recording substrate treatment apparatus and a printing system including such a gas impingement device and a method of drying a recording substrate by using the gas impingement device are also disclosed.