Gas impingement device, recording substrate treatment apparatus and printing system comprising such gas impingement device
A gas impingement device includes a first surface including a pattern of a plurality of gas outlets, the pattern including a number of substantially parallel rows of gas outlets, the rows arranged in a direction, which direction is at a skew angle α with a front edge of the first surface of the gas...
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | A gas impingement device includes a first surface including a pattern of a plurality of gas outlets, the pattern including a number of substantially parallel rows of gas outlets, the rows arranged in a direction, which direction is at a skew angle α with a front edge of the first surface of the gas impingement device. A recording substrate treatment apparatus and a printing system including such a gas impingement device and a method of drying a recording substrate by using the gas impingement device are also disclosed. |
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