Method of forming a photonic crystal material

A method of forming a film of photonic crystal material. A first process is performed upon a material capable of having a photonic crystal structure, this process causing deformation of the material so as to form a film in which incident light received by the material is selectively reflected or tra...

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Bibliographische Detailangaben
Hauptverfasser:	Hellmann, Götz Peter, Spahn, Peter Wolfgang Andreas, Vulpius, Günther
Format:	Patent
Sprache:	eng
Schlagworte:	ADVERTISING AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING BOOK COVERS BOOKBINDING CODING OR CIPHERING APPARATUS FOR CRYPTOGRAPHIC OR OTHERPURPOSES INVOLVING THE NEED FOR SECRECY CRYPTOGRAPHY DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDEDFOR DISPLAY EDUCATION FILES GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS LOOSE LEAVES MANUFACTURE OR TREATMENT OF NANOSTRUCTURES MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES MOVABLE-STRIP WRITING OR READING APPARATUS NANOTECHNOLOGY PERFORMING OPERATIONS PHYSICS PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITYFEATURES PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOTOTHERWISE PROVIDED FOR SEALS SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR SHAPING OR JOINING OF PLASTICS SPECIAL PRINTED MATTER SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION TECHNICAL SUBJECTS COVERED BY FORMER USPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS TRANSPORTING WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
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Beschreibung
Zusammenfassung:	A method of forming a film of photonic crystal material. A first process is performed upon a material capable of having a photonic crystal structure, this process causing deformation of the material so as to form a film in which incident light received by the material is selectively reflected or transmitted to generate a first optical effect in the film. A second process is performed upon substantially all of the film which applies a shear stress to the film. This causes a change in the material structure so as to generate a second optical effect in the film, different from the first optical effect, in response to incident light. Security films, devices, articles and documents formed using the method are also discussed.