Resist structure of an electrowetting element

An electrowetting element comprises a first fluid and a second fluid immiscible with the first fluid. A first support plate comprises a first substrate; an electrode; and a layer in contact with at least one of the first fluid or the second fluid. A second support plate comprises a second substrate....

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Bibliographische Detailangaben
Hauptverfasser:	Fischer, Iren, Feenstra, Bokke Johannes, Boon, Gerben, Massard, Romaric Mathieu
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	An electrowetting element comprises a first fluid and a second fluid immiscible with the first fluid. A first support plate comprises a first substrate; an electrode; and a layer in contact with at least one of the first fluid or the second fluid. A second support plate comprises a second substrate. One of the first support plate or the second support plate comprises a resist structure protruding in a direction towards the other one of the first support plate or the second support plate. The resist structure comprises a polymer nanocomposite material.