Cleaning system for cleaning a photoconductive surface
Cleaning a photoconductive surface (16) from particles and excess fluid with at least two wiper blades, wherein a first wiper blade (12) is to contact the photoconductive surface (16) and to wipe at least some of the particles and at least some of the excess fluid from the photoconductive surface (1...
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | Cleaning a photoconductive surface (16) from particles and excess fluid with at least two wiper blades, wherein a first wiper blade (12) is to contact the photoconductive surface (16) and to wipe at least some of the particles and at least some of the excess fluid from the photoconductive surface (16) and wherein a second wiper blade (14) is to contact the photoconductive surface (16) and to wipe at least some of the particles and at least some of the excess fluid that have passed the first wiper blade, from the photoconductive surface (16). |
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