Optomechanical force sensors, cantilevers, and systems thereof

An optomechanical force sensor includes a substrate, a cantilevered beam anchored to the substrate, and a probe tip positioned near an end of the cantilevered beam distal to the substrate. A suspended waveguide is disposed on the cantilevered beam and is optically continuous with an input/output wav...

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Bibliographische Detailangaben
Hauptverfasser:	Eichenfield, Matt, Henry, Michael David, Jones, Adam, Camacho, Ryan, Douglas, James Kenneth, Douglas, Erica Ann
Format:	Patent
Sprache:	eng
Schlagworte:	APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBEMICROSCOPY [SPM] MANUFACTURE OR TREATMENT OF NANOSTRUCTURES MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES MEASURING NANOTECHNOLOGY OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS PERFORMING OPERATIONS PHYSICS SCANNING-PROBE TECHNIQUES OR APPARATUS SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES TESTING TRANSPORTING
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Beschreibung
Zusammenfassung:	An optomechanical force sensor includes a substrate, a cantilevered beam anchored to the substrate, and a probe tip positioned near an end of the cantilevered beam distal to the substrate. A suspended waveguide is disposed on the cantilevered beam and is optically continuous with an input/output waveguiding structure. An optical cavity is defined within the suspended waveguide.