Exposure apparatus, exposure method, and method for producing device

An exposure apparatus includes an optical member that can be provided on a stage. The optical member has a first surface contacting a liquid when moved to face a projection system, and a second surface contacting a gas and transmitting light having come from the projection system via the liquid and...

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Bibliographische Detailangaben
Hauptverfasser: Hikima, Ikuo, Toyoda, Mitsunori, Nishinaga, Hisashi, Emura, Nozomu, Nakagawa, Masahiro, Mizuno, Yasushi, Tanitsu, Osamu, Hagiwara, Tsuneyuki, Kita, Naonori
Format: Patent
Sprache:eng
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Zusammenfassung:An exposure apparatus includes an optical member that can be provided on a stage. The optical member has a first surface contacting a liquid when moved to face a projection system, and a second surface contacting a gas and transmitting light having come from the projection system via the liquid and the first surface. The optical member is configured such that at least a large-angle ray of the light, which has an angle with an optical axis of the projection system sufficiently large to undergo total reflection at an end surface of the projection system when the liquid is absent, travels from the projection system to the second surface without passing through gas. The second surface transmits the large-angle ray, which is received by the light-receiving surface.