Dynamic server-level thermal control using inlet and exhaust temperatures

An apparatus for monitoring and maintaining thermal exhaust temperatures for monitored servers may include a processor in communication with an exhaust temperature control system. The processor may implement various control loops to monitor inlet and exhaust temperatures for one or more servers, and...

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Bibliographische Detailangaben
Hauptverfasser: Newcomb, Thomas Chris, Stiver, David W, Imwalle, Gregory, Schran, Andrew J
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:An apparatus for monitoring and maintaining thermal exhaust temperatures for monitored servers may include a processor in communication with an exhaust temperature control system. The processor may implement various control loops to monitor inlet and exhaust temperatures for one or more servers, and the processor may monitor temperatures of various hardware components within those one or more servers. When the processor determines that a hardware component for a given server is overheating, the processor may take steps to decrease the temperature of the overheating hardware component for the given server. To determine whether a hardware component is overheating, the processor may leverage the hardware component's operating temperature margin.