A POLISHING MIXTURE
Proposed polishing composition provides increase of output of capable detector modules and increase of radiosenstitivity thereof. It comprises low-molecular polyorganosiloxane caoutchouc of CKTH-MED type having viscosity of 7 poise as wetting liquid and high-dispersed silicon dioxide in quantity of...
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| creator | HALKIN SERHII MYKOLAIOVYCH VORONKOV YEVHENII FEDOROVYCH KVITNYTSKA VALENTYNA ZAKHARIVNA OPOLONIN OLEKSANDR DMYTROVYCH RYZHYKOV VOLODYMYR DIOMYDOVYCH KOZYN DMYTRO MYKOALIOVYCH |
| description | Proposed polishing composition provides increase of output of capable detector modules and increase of radiosenstitivity thereof. It comprises low-molecular polyorganosiloxane caoutchouc of CKTH-MED type having viscosity of 7 poise as wetting liquid and high-dispersed silicon dioxide in quantity of 2-3 weight % as an abrasive material. |
| format | Patent |
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| language | eng |
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| subjects | ADHESIVES CHEMISTRY DYES MEASUREMENT OF NUCLEAR OR X-RADIATION MEASURING METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS PHYSICS POLISHES POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH SKI WAXES TESTING |
| title | A POLISHING MIXTURE |
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